[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Electromigration of submicron Damascene copper interconnects
Changsup Ryu,, Kee-Won Kwon,, Loke, A.L.S., Dubin, V.M., Kavari, R.A., Ray, G.W., Wong, S.S.Year:
1998
Language:
english
DOI:
10.1109/vlsit.1998.689238
File:
PDF, 356 KB
english, 1998