Planar HTS device process using ion implantation

IEEE Transactions on Appiled Superconductivity 1997 / 6 Vol. 7; Iss. 2

Planar HTS device process using ion implantation

Ma, Q.Y.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
7
Language:
english
Journal:
IEEE Transactions on Appiled Superconductivity
DOI:
10.1109/77.621798
Date:
June, 1997
File:
PDF, 842 KB
english, 1997
Conversion to is in progress
Conversion to is failed