Role of sulfur atoms in microwave plasma etching of silicon

Journal of Applied Physics 1987 Vol. 62; Iss. 4

Role of sulfur atoms in microwave plasma etching of silicon

Ninomiya, Ken, Suzuki, Keizo, Nishimatsu, Shigeru, Okada, Osami
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Volume:
62
Year:
1987
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.339652
File:
PDF, 1.21 MB
english, 1987
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