[IEEE IEEE 2000 International Interconnect Technology Conference - Burlingame, CA, USA (5-7 June 2000)] Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407) - Cleaning process strategies compatible with low-k dielectric and copper: state of the art, evolution and perspectives
Louis, D., Beverina, A., Arvet, C., Lajoinie, E., Peyne, C., Holmes, D., Maloney, D., Lee, S., Lee, W.M.Year:
2000
Language:
english
DOI:
10.1109/iitc.2000.854339
File:
PDF, 318 KB
english, 2000