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[IEEE IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004. - San Francisco, CA, USA (Dec. 13-15, 2004)] IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004. - A novel methodology on tuning work function of metal, gate using stacking bi-metal layers
Jeon, I.S., Lee, J., Zhao, P., Sivasubramani, P., Oh, T., Kim, J., Cha, D., Huang, J., Kim, M.J., Gnade, B.E., Kim, J., Wallace, R.M.Year:
2004
Language:
english
DOI:
10.1109/iedm.2004.1419139
File:
PDF, 298 KB
english, 2004