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[IEEE 2008 16th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Las Vegas, NV, USA (2008.09.30-2008.10.3)] 2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors - Impact of multiple sub-melt laser scans on the activation and diffusion of shallow Boron junctions
Rosseel, E., Vandervorst, W., Clarysse, T., Goossens, J., Moussa, A., Lin, R., Petersen, D.H., Nielsen, P.F., Hansen, O., Bennett, N.S., Cowern, N.E.B.Year:
2008
Language:
english
DOI:
10.1109/rtp.2008.4690547
File:
PDF, 2.57 MB
english, 2008