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[IEEE 2006 IEEE International Conference on Microelectronic Test Structures - Austin, TX, USA (2006.03.6-2006.03.9)] 2006 IEEE International Conference on Microelectronic Test Structures - Design and fabrication of a copper test structure for use as an electrical critical dimension reference
Shulver, B.J.R., Bunting, A.S., Gundlach, A.M., Haworth, L.I., Ross, A.W.S., Snell, A.J., Stevenson, J.T.M., Walton, A.J., Allen, R.A., Cresswell, M.W.Year:
2006
Language:
english
DOI:
10.1109/icmts.2006.1614288
File:
PDF, 917 KB
english, 2006