Use of 22 nm Litho SEM Non-visual Defect Data as a Process...

IEEE Transactions on Semiconductor Manufacturing 2013 / 11 Vol. 26; Iss. 4

Use of 22 nm Litho SEM Non-visual Defect Data as a Process Quality Indicator

Boye, Carol A., Knupp, Seth, Ghaskadvi, Rajesh
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Volume:
26
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2013.2273294
Date:
November, 2013
File:
PDF, 14.76 MB
english, 2013
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