[IEEE International Electron Devices Meeting. IEDM Technical Digest - Washington, DC, USA (7-10 Dec. 1997)] International Electron Devices Meeting. IEDM Technical Digest - An application of process synthesis methodology for first-pass fabrication success of high-performance deep-submicron CMOS
Saxena, S., Burch, R., Vasanth, K., Rao, S., Fernando, C., Davis, J., Mozumder, P.K.Year:
1997
Language:
english
DOI:
10.1109/iedm.1997.650283
File:
PDF, 336 KB
english, 1997