[IEEE International Symposium on VLSI Technology Systems and Applications - Taipei, Taiwan (8-10 June 1999)] 1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453) - 2.5 Ω/□ W/TiN/poly stack gate technology for high density and embedded DRAM technology
Hu, Y., Anderson, D., Rotondaro, A., Obrien, S., Wei-Yung Hsu,, Kraft, R., Tiner, P., Nicollian, P., Aur, S.Year:
1999
Language:
english
DOI:
10.1109/vtsa.1999.786046
File:
PDF, 244 KB
english, 1999