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[IEEE 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Cambridge, MA, USA (2008.05.5-2008.05.7)] 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Use of Virtual Metrology for in-situ Visualization of Thermal Uniformity and Handoff Adjustment in RTP Critical Anneals
Vitale, Victor, Aderhold, Wolfgang, Hunter, Aaron, Iliopoulos, Ilias, Kroupnova, Natalia, Yanovich, Aleksey, Merry, NirYear:
2008
Language:
english
DOI:
10.1109/asmc.2008.4529067
File:
PDF, 311 KB
english, 2008