[IEEE 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Honolulu, HI, USA (June 13-15, 2006)] 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Highly Manufacturable 45nm LSTP CMOSFETs Using Novel Dual High-k and Dual Metal Gate CMOS Integration
Song, S., Zhang, Z., Hussain, M., Huffman, C., Barnett, J., Bae, S., Li, H., Majhi, P., Park, C., Ju, B., Park, H., Kang, C., Choi, R., Zeitzoff, P., Tseng, H., Lee, B., Jammy, R.Year:
2006
Language:
english
DOI:
10.1109/vlsit.2006.1705193
File:
PDF, 692 KB
english, 2006