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[IEEE 2010 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2010.12.6-2010.12.8)] 2010 International Electron Devices Meeting - MuGFET carrier mobility and velocity: Impacts of fin aspect ratio, orientation and stress
Nuo Xu,, Xin Sun,, Weize Xiong,, Rinn Cleavelin, C., Tsu-Jae King Liu,Year:
2010
Language:
english
DOI:
10.1109/iedm.2010.5703323
File:
PDF, 509 KB
english, 2010