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Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor
Arup Dasgupta, P. Kuppusami, Falix Lawrence, V.S. Raghunathan, P. Antony Premkumar, K.S. NagarajaVolume:
374
Year:
2004
Language:
english
Pages:
7
DOI:
10.1016/j.msea.2004.03.021
File:
PDF, 361 KB
english, 2004