Atomistic model of ultra-smooth amorphous thin film growth by low-energy ion-assisted physical vapour deposition
Alvarez, R, Vazquez, L, Gago, R, Redondo-Cubero, A, Cotrino, J, Palmero, AVolume:
46
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/46/39/395303
Date:
October, 2013
File:
PDF, 1.63 MB
english, 2013