SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - A new SEM CD operator verified against Monte Carlo simulations
Frase, C. G., Gnieser, D., Dirscherl, K., Buhr, E., Bosse, H., Archie, Chas N.Volume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.712503
File:
PDF, 1.05 MB
english, 2007