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[IEEE 2009 IEEE International Interconnect Technology Conference - IITC - Sapporo, Japan (2009.06.1-2009.06.3)] 2009 IEEE International Interconnect Technology Conference - Constant field stressing of via-to-line spacing for accurate projection of intrinsic TDDB lifetime
Kamoshima, Takao, Makabe, Kazuya, Amishiro, Masatsugu, Furusawa, Takeshi, Takata, Yoshifumi, Ogasawara, MakotoYear:
2009
Language:
english
DOI:
10.1109/iitc.2009.5090383
File:
PDF, 588 KB
english, 2009