![](/img/cover-not-exists.png)
[IEEE Proceedings of the IEEE 2004 International Interconnect Technology Conference - Burlingame, CA, USA (7-9 June 2004)] Proceedings of the IEEE 2004 International Interconnect Technology Conference (IEEE Cat. No.04TH8729) - BEOL process integration of 65nm Cu/low k interconnects
Jeng, C.C., Wan, W.K., Lin, H.H., Ming-Shuo Liang,, Tang, K.H., Kao, I.C., Lo, H.C., Chi, K.S., Huang, T.C., Yao, C.H., Lin, C.C., Lei, M.D., Hsia, C.C., Mong-Song Liang,Year:
2004
Language:
english
DOI:
10.1109/iitc.2004.1345745
File:
PDF, 346 KB
english, 2004