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[IEEE ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005. - San Jose, CA, USA (2005.09.13-2005.09.15)] ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005. - Improve hot phosphoric process robustness in 300 mm nitride strip wet bench
Calvier, J.-J., Piard, V., Henderson, C., Garnier, P., Horellou, G., Geomini, M.Year:
2005
Language:
english
DOI:
10.1109/issm.2005.1513399
File:
PDF, 276 KB
english, 2005