Properties of titanium nitride films prepared by direct...

Materials Science and Engineering: A 2007 Vol. 445-446; Iss. none

Properties of titanium nitride films prepared by direct current magnetron sputtering

Y.L. Jeyachandran, Sa.K. Narayandass, D. Mangalaraj, Sami Areva, J.A. Mielczarski
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Volume:
445-446
Year:
2007
Language:
english
Pages:
14
DOI:
10.1016/j.msea.2006.09.021
File:
PDF, 1.67 MB
english, 2007
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