[IEEE 2010 IEEE International Memory Workshop - Seoul, Korea (South) (2010.05.16-2010.05.19)] 2010 IEEE International Memory Workshop - Investigation of charge-trap memories with AlN based band engineered storage layers
Molas, G., Colonna, J. P., Kies, R., Belhachemi, D., Bocquet, M., Gely, M., Vidal, V., Brianceau, P., Vandroux, L., Ghibaudo, G., De Salvo, B.Year:
2010
Language:
english
DOI:
10.1109/imw.2010.5488309
File:
PDF, 276 KB
english, 2010