[IEEE 2007 International Semiconductor Device Research Symposium - College Park, MD, USA (2007.12.12-2007.12.14)] 2007 International Semiconductor Device Research Symposium - Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers
Andy Eu-Jin Lim,, Wei-Wei Fang,, Fangyue Liu,, Lee, Rinus T. P., Samudra, Ganesh S., Dim-Lee Kwong,, Yee-Chia Yeo,Year:
2007
Language:
english
DOI:
10.1109/isdrs.2007.4422245
File:
PDF, 669 KB
english, 2007