[IEEE 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) - Suzhou, China (2013.08.26-2013.08.30)] 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale - High-energy electron beam lithography process simulation
Gan, Qi, Zhou, Zai-Fa, Pan, Jiang-YongYear:
2013
Language:
english
DOI:
10.1109/3m-nano.2013.6737408
File:
PDF, 185 KB
english, 2013