[IEEE 2009 International Workshop on Junction Technology...

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[IEEE 2009 International Workshop on Junction Technology (IWJT) - Kyoto, Japan (2009.06.11-2009.06.12)] 2009 International Workshop on Junction Technology - Characterization of junction activation and deactivation using non-equilibrium annealing: Solid phase epitaxy, spike annealing, laser annealing instructions for

Bersani, M., Pepponi, G., Giubertoni, D., Gennaro, S., Sahiner, M. A., Kelty, S. P., Kah, M., Kirkby, K. J., Doherty, R., Foad, M. A., Meirer, F., Streli, C., Woicik, J. C., Pianetta, P.
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Year:
2009
Language:
english
DOI:
10.1109/iwjt.2009.5166221
File:
PDF, 993 KB
english, 2009
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