[IEEE 2008 International Workshop on Junction Technology (IWJT) - Shanghai, China (2008.05.15-2008.05.16)] Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) - Extremely ultrashallow junctions for a high-linearity silicon-on-glass RF varactor-diode technology
Nanver, Lis K., Sarubbi, Francesco, Gonda, Viktor, Popadic, Milos, Scholtes, Tom L.M., de Boer, Wiebe, Buisman, KoenYear:
2008
Language:
english
DOI:
10.1109/iwjt.2008.4540027
File:
PDF, 288 KB
english, 2008