[IEEE 2008 International Workshop on Junction Technology...

  • Main
  • [IEEE 2008 International Workshop on...

[IEEE 2008 International Workshop on Junction Technology (IWJT) - Shanghai, China (2008.05.15-2008.05.16)] Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) - Extremely ultrashallow junctions for a high-linearity silicon-on-glass RF varactor-diode technology

Nanver, Lis K., Sarubbi, Francesco, Gonda, Viktor, Popadic, Milos, Scholtes, Tom L.M., de Boer, Wiebe, Buisman, Koen
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2008
Language:
english
DOI:
10.1109/iwjt.2008.4540027
File:
PDF, 288 KB
english, 2008
Conversion to is in progress
Conversion to is failed