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[IEEE kshop on Junction Technology - Osaka, Japan (2005.06.7-2005.06.8)] Extended Abstracts of the Fifth International Workshop on Junction Technology - Hydrogen effect on ultra-shallow arsenic n/sup +//p junction formed by AsH/sub 3/ plasma doping (PLAD)
Sungho Heo,, Sungkweon Baek,, Dongkyu Lee,, Gyongho Buh,, Yugyun Sin,, Hyunsang Hwang,Year:
2005
Language:
english
DOI:
10.1109/iwjt.2005.203884
File:
PDF, 1.57 MB
english, 2005