Highly Sensitive Focus Monitoring on Production Wafer by...

IEEE Transactions on Semiconductor Manufacturing 2007 / 08 Vol. 20; Iss. 3

Highly Sensitive Focus Monitoring on Production Wafer by Scatterometry Measurements for 90/65-nm Node Devices

Kawachi, Toshihide, Fudo, Hidekimi, Iwata, Yoshio, Matsumoto, Shunichi, Sasazawa, Hideaki, Mori, Tadayoshi
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Volume:
20
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2007.901831
Date:
August, 2007
File:
PDF, 1.93 MB
english, 2007
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