An optimal high contrast e-beam lithography process for the...

An optimal high contrast e-beam lithography process for the patterning of dense fin networks

F. Fruleux-Cornu, J. Penaud, E. Dubois, M. François, M. Muller
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
26
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.msec.2005.09.017
File:
PDF, 370 KB
english, 2006
Conversion to is in progress
Conversion to is failed