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An optimal high contrast e-beam lithography process for the patterning of dense fin networks
F. Fruleux-Cornu, J. Penaud, E. Dubois, M. François, M. MullerVolume:
26
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.msec.2005.09.017
File:
PDF, 370 KB
english, 2006