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[Japan Soc. Appl. Phys 1995 Symposium on VLSI Technology. Digest of Technical Papers - Kyoto, Japan (6-8 June 1995)] 1995 Symposium on VLSI Technology. Digest of Technical Papers - A novel low-temperature process for high dielectric constant BST thin films for ULSI DRAM applications
Khamankar, R., Jiang, B., Tsu, R., Hsu, W.-Y., Nulman, J., Summerfelt, S., Anthony, M., Lee, J.Year:
1995
Language:
english
DOI:
10.1109/VLSIT.1995.520890
File:
PDF, 223 KB
english, 1995