The Use of Electron-Beam Lithography for Localized...

IEEE Transactions on Nuclear Science 2011 / 06 Vol. 58; Iss. 3

The Use of Electron-Beam Lithography for Localized Micro-Beam Irradiations

Gonzalez-Velo, Y., Boch, J., Pichot, F., Mekki, J., Roche, N. J.-H., Perez, S., Deneau, C., Vaille, J.-R., Dusseau, L., Saigne, F., Lorfevre, E., Schrimpf, R. D.
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Volume:
58
Language:
english
Journal:
IEEE Transactions on Nuclear Science
DOI:
10.1109/tns.2011.2128885
Date:
June, 2011
File:
PDF, 1.23 MB
english, 2011
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