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[American Vacuum Soc 2002 7th International Symposium on Plasma- and Process-Induced Damage - Maui, HI, USA (5-7 June 2002)] 7th International Symposium on Plasma- and Process-Induced Damage - Plasma induced damage from via etching in pMOSFETs
Cellere, G., Valentini, M.G., Baraldo, A., Paccagnella, A.Year:
2002
Language:
english
DOI:
10.1109/PPID.2002.1042622
File:
PDF, 269 KB
english, 2002