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Comparison of p+–n junction formed by BF2+ and B+ implantation in silicon microstrip detector with low and high thermal budget: impact of fluorine on electrical characteristics
Ajay K. Srivastava, Ashutosh Bhardwaj, Kirti Ranjan, Namrata, Sudeep Chatterji, R.K. ShivpuriVolume:
6
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/j.mssp.2003.07.012
File:
PDF, 458 KB
english, 2003