Diffusion profiles of low dosages chromium ions implanted into (1 0 0) crystalline silicon
F. Salman, P. Zhang, L. Chow, F.A. StevieVolume:
9
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.mssp.2006.01.010
File:
PDF, 208 KB
english, 2006