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High-dielectric constant AlON prepared by RF gas-timing sputtering for high capacitance density
A. Poyai, W. Bunjongpru, N. Klunngien, S. Porntheerapat, C. Hruanan, S. Sopitpan, J. NukeawVolume:
11
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.mssp.2008.07.012
File:
PDF, 532 KB
english, 2008