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[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - A novel bi-layer cobalt silicide process with nitrogen implantation for sub-50 nm CMOS and beyond
Itonaga, K., Eriguchi, K., Miyanaga, I., Kajiya, A., Ogura, M., Tsutsumi, T., Sayama, H., Oda, H., Eimori, T., Morimoto, H.Year:
2002
Language:
english
DOI:
10.1109/vlsit.2002.1015424
File:
PDF, 255 KB
english, 2002