Design-for-Manufacture for Multigate Oxide CMOS Process

IEEE Transactions on Semiconductor Manufacturing 2008 Vol. 21; Iss. 1

Design-for-Manufacture for Multigate Oxide CMOS Process

Lin, Qi, Ma, Mei, Vo, Tony, Fan, Jenny, Wu, Xin, Li, Richard, Li, Xiao-Yu
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Volume:
21
Year:
2008
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2007.913190
File:
PDF, 1.91 MB
english, 2008
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