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[IEEE Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Honolulu, HI, USA (2004.06.17-2004.06.17)] Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Ultra-low cost and high performance 65nm CMOS device fabricated with plasma doping
Lallement, F., Duriez, B., Grouillet, A., Arnaud, F., Tavel, B., Wacquant, F., Stolk, P., Woo, M., Erokhin, Y., Scheuer, J., Godet, L., Weeman, J., Distaso, D., Lenoble, D.Year:
2004
Language:
english
DOI:
10.1109/vlsit.2004.1345465
File:
PDF, 172 KB
english, 2004