[IEEE 2013 IEEE 13th International Conference on Nanotechnology (IEEE-NANO) - Beijing, China (2013.08.5-2013.08.8)] 2013 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013) - Monte Carlo simulation of high-energy electron beam lithography process
Pan, Jiang-Yong, Zhou, Zai-Fa, Gan, Qi, Xu, Wen-QinYear:
2013
Language:
english
DOI:
10.1109/nano.2013.6720956
File:
PDF, 647 KB
english, 2013