[IEEE Proceedings., Second International Conference on Properties and Applications of Dielectric Materials - Beijing, China (12-16 Sept. 1988)] Proceedings., Second International Conference on Properties and Applications of Dielectric Materials - Silicon dioxide films fabricated by ECR microwave plasmas
Chau, T.T., Herak, T.V., Thomson, D.J., Mejia, S.R., Buchanan, D.A., McLeod, R.D., Kao, K.C.Year:
1988
Language:
english
DOI:
10.1109/icpadm.1988.38367
File:
PDF, 395 KB
english, 1988