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[IEEE 2006 International Workshop on Junction Technology - Shanghai, China ()] 2006 International Workshop on Junction Technology - Influence of the Annealing Ambient on the Thermal Stability of Ni Silicide for nano-scale CMOSFETs
Soon-Young Oh,, Hi-Deok Lee,, Jin-Suk Wang,Year:
2006
Language:
english
DOI:
10.1109/iwjt.2006.220891
File:
PDF, 3.07 MB
english, 2006