[IEEE 2014 IEEE International Interconnect Technology...

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[IEEE 2014 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC) - San Hose, CA, USA (2014.5.20-2014.5.23)] IEEE International Interconnect Technology Conference - Novel stress-free Keep Out Zone process development for via middle TSV in 20nm planar CMOS technology

Rabie, Mohamed A., S., Premachandran C., Ranjan, Rakesh, Natarajan, Mahadevan Iyer, Yap, Sing Fui, Smith, Daniel, Thangaraju, Sarasvathi, Alapati, Ramakanth, Benistant, Francis
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Year:
2014
Language:
english
DOI:
10.1109/iitc.2014.6831870
File:
PDF, 849 KB
english, 2014
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