Conformality of Al[sub 2]O[sub 3] and AlN Deposited by...

Journal of The Electrochemical Society 2010 Vol. 157; Iss. 4

Conformality of Al[sub 2]O[sub 3] and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition

Dendooven, J., Deduytsche, D., Musschoot, J., Vanmeirhaeghe, R. L., Detavernier, C.
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Volume:
157
Year:
2010
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3301664
File:
PDF, 342 KB
english, 2010
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