[IEEE 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Honolulu, HI, USA (June 13-15, 2006)] 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Pre-Metal Dielectric Stress Engineering by a Novel Plasma Treatment and Integration Scheme for nMOS Performance Improvement
Jeong, Y.-K., Shin, D., Kim, A., Yoon, I., Nam, S.-W., Lee, S.-J., Park, K.-K., Kim, K., Shin, H.-J., Roh, K., Kang, K.-H., Choi, Y.-H., Seo, G.-H., Lee, K., Chu, K., Lee, N.-I.Year:
2006
Language:
english
DOI:
10.1109/VLSIT.2006.1705254
File:
PDF, 359 KB
english, 2006