Growth Kinetics of Polycrystalline Silicon from Silane by...

Growth Kinetics of Polycrystalline Silicon from Silane by Thermal Chemical Vapor Deposition Method

Hashimoto, Kenji
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Volume:
137
Year:
1990
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2086544
File:
PDF, 1.16 MB
english, 1990
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