[IEEE Extended Abstracts of the Fourth International Workshop on Junction Technology - Shanghai, China (15-16 March 2004)] The Fourth International Workshop on Junction Technology, 2004. IWJT '04. - Overview of the prospects of ultra-rapid thermal process for advanced CMOSFETs
Suguro, K., Ito, T., Matsuo, K., Iinuma, T., Nishinohara, K.T.Year:
2004
Language:
english
DOI:
10.1109/iwjt.2004.1306748
File:
PDF, 284 KB
english, 2004