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[IEEE 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. - San Jose, CA, USA (April 17-21, 2005)] 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. - New approach of 90nm low-k interconnect evaluation using a voltage ramp dielectric breakdown (VRDB) test
Aubel, O., Kiene, M., Yao, W.Year:
2005
Language:
english
DOI:
10.1109/relphy.2005.1493133
File:
PDF, 1.02 MB
english, 2005