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[IEEE 2010 IEEE International Interconnect Technology Conference - IITC - Burlingame, CA, USA (2010.06.6-2010.06.9)] 2010 IEEE International Interconnect Technology Conference - Minimization of plasma ashing damage to OSG low-k dielectrics

Shi, H., Huang, H., Im, J., Ho, P. S., Zhou, Y., Pender, J. T., Armacost, M., Kyser, D.
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Year:
2010
Language:
english
DOI:
10.1109/iitc.2010.5510308
File:
PDF, 244 KB
english, 2010
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