The residual stress instrument with optimized...

The residual stress instrument with optimized Si(2 2 0) monochromator and position-sensitive detector at HANARO

Chang-Hee Lee, Myung-Kook Moon, Vyacheslav T. Em, Young-Hyun Choi, Jong-Kyu Cheon, Uk-Won Nam, Kyung-Nam Kong
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Volume:
545
Year:
2005
Language:
english
Pages:
10
DOI:
10.1016/j.nima.2005.01.337
File:
PDF, 350 KB
english, 2005
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