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[IEEE 2010 IEEE International Interconnect Technology Conference - IITC - Burlingame, CA, USA (2010.06.6-2010.06.9)] 2010 IEEE International Interconnect Technology Conference - The improvement of electrical programmable fuse with salicide-block dielectric film in 40nm CMOS Technology

Wu, Kuei-Sheng, Wong, Chang-Chien, Chi, Sinclair, Tseng, Ching-Hsiang, Huang, Purple, Huang, Devon, Su, Titan
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Year:
2010
Language:
english
DOI:
10.1109/iitc.2010.5510461
File:
PDF, 501 KB
english, 2010
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