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[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Rigorous topography simulation of contamination to defect transformation
Xiaolei Li,, Strojwas, A., Swecker, A., Milor, L., Yung-Tao Lin,Year:
1997
Language:
english
DOI:
10.1109/sispad.1997.621407
File:
PDF, 478 KB
english, 1997